Tungsten telluride WTe2 Sputtering Targets

Tungsten telluride (WTe2) Introduction

Tungsten telluride (WTe2) is a layered crystalline compound composed of tungsten and tellurium. Its unique structure consists of distorted 1T layers, where flat layers of tellurium atoms sandwich layers of tungsten atoms. The strong covalent bonds within each layer contrast with the weaker van der Waals-type interaction between the layers, resulting in a layered, quasi-two-dimensional crystal structure reminiscent of graphite.

Apart from its intriguing crystal structure, tungsten telluride exhibits fascinating electronic properties, including remarkably high magnetoresistance. Under the influence of a magnetic field, its electrical resistance can undergo significant changes. This property has attracted attention for potential applications in electronic devices, particularly in spin/magnetoelectronics. Furthermore, tungsten telluride is being investigated for its thermoelectric properties. As a p-type thermoelectric material, it holds the potential to convert heat into electricity effectively.

About Our WTe2 Target

QS Advanced Materials Inc. operates multiple hot pressers, enabling us to produce gadolinium sputtering targets ranging in size from 1 inch in diameter up to over 10 inches. Our typical WTe2 targets achieve a purity level of over 99.99% with available size from 1″ diameter to 10 inch.

For many years, QSAM has supplied countless telluride sputtering targets and specialty ceramics to laboratories and advanced technology companies across the United States. We serve as a good fellow for customers’ research needs. We take pride in manufacturing gadolinium sputtering targets to support the innovation of America’s science and engineering community. Our targets provide a critical resource to help drive technological progress.

Sputtering telluride sputter targets

Sputtering is a commonly used thin film deposition technique for producing coatings of various materials, including tungsten telluride (WTe2). To begin the sputtering process, a tungsten telluride target is first prepared. Subsequently, the target is placed inside the sputter chamber alongside a substrate at an appropriate position to ensure stability. Moreover, it is important to keep the substrate surface clean during deposition.

Next, key sputtering parameters can be adjusted as needed. Specifically, deposition time, gas pressure, gas composition and other factors are considered. Fundamentally, these parameters influence attributes of the deposited thin film such as thickness and structure. Ultimately, properties of the resulting WTe2 thin film like electrical, optical and magnetic characteristics are impacted. Therefore, by properly setting the sputtering conditions, high quality WTe2 coatings with tailored traits for specific applications can be formed. In summary, sputtering offers an effective fabrication method for reproducibly producing WTe2 thin films with optimized performance.

Gadolinium’s physical properties